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Cited article:

Preliminary studies of atmospheric pressure plasma enhanced CVD (AP-PECVD) of thin oxide films

N. McSporran, M.L. Hitchman, S.E. Alexandrov, S.H. Shamlian, S. Turnbull, S. Turnbull

J. Phys. IV France, 12 4 (2002) 17-23

DOI: https://doi.org/10.1051/jp4:20020072

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This article has been cited by the following article(s):

Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition of a-SiCN:H Films: Role of Precursors on the Film Growth and Properties

Srinivasan Guruvenket, Steve Andrie, Mark Simon, Kyle W Johnson and Rob A Sailer
ACS Applied Materials & Interfaces 120914114057008 (2012)
https://doi.org/10.1021/am301157p

Michael L. Hitchman and Sergei E. Alexandrov
45 1173 (2006)
https://doi.org/10.4028/www.scientific.net/AST.45.1173