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Cited article:

Microwave plasma enhanced CVD of aluminum oxide films: Influence of the deposition parameter on the films characteristics

H. Hidalgo, P. Tristant, A. Denoirjean, J. Desmaison

J. Phys. IV France, 11 PR3 (2001) Pr3-723-Pr3-730

DOI: https://doi.org/10.1051/jp4:2001391

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Physico-chemistry and morphology of silicon surface during the first stage of alumina deposition

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