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Cited article:

Remote hydrogen plasma chemical vapor deposition from alkylsilane and alkylcarbosilane single-sources: Mechanism of the process and properties of resulting silicon-carbon deposits

A.M. Wrobel

J. Phys. IV France, 11 PR3 (2001) Pr3-691-Pr3-702

DOI: https://doi.org/10.1051/jp4:2001388

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This article has been cited by the following article(s):

Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 1. Kinetics of the Process; Chemical and Morphological Structure of Deposited Silicon−Carbon Films

A. M. Wróbel, A. Walkiewicz-Pietrzykowska, J. E. Klemberg-Sapieha, et al.
Chemistry of Materials 15 (8) 1749 (2003)
https://doi.org/10.1021/cm021250c