Articles citing this article

The Citing articles tool gives a list of articles citing the current article.
The citing articles come from EDP Sciences database, as well as other publishers participating in CrossRef Cited-by Linking Program. You can set up your personal account to receive an email alert each time this article is cited by a new article (see the menu on the right-hand side of the abstract page).

Cited article:

Al₂O₃ growth optimisation using aluminium dimethylisopropoxide as precursor as a function of reaction conditions and reacting gases

D. Barreca, G.A. Battiston, G. Carta, R. Gerbasi, G. Rossetto, E. Tondello, P. Zanella

J. Phys. IV France, 11 PR3 (2001) Pr3-539-Pr3-546

DOI: https://doi.org/10.1051/jp4:2001368

PDF (379.6 KB)

This article has been cited by the following article(s):

MOCVD deposition of CoAl2O4 films

G. Carta, M. Casarin, N. El Habra, et al.
Electrochimica Acta 50 (23) 4592 (2005)
https://doi.org/10.1016/j.electacta.2004.10.094

CVD of Al2O3 Thin Films Using Aluminum Tri‐isopropoxide

S. Blittersdorf, N. Bahlawane, K. Kohse‐Höinghaus, B. Atakan and J. Müller
Chemical Vapor Deposition 9 (4) 194 (2003)
https://doi.org/10.1002/cvde.200306248