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Cited article:

Chemical Vapor Deposition for Nanotechnology

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Chemical Vapor Deposition for Nanotechnology (2019)
https://doi.org/10.5772/intechopen.80244

Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

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Coatings 7 (2) 24 (2017)
https://doi.org/10.3390/coatings7020024

TiO2 anatase films obtained by direct liquid injection atomic layer deposition at low temperature

L. Avril, S. Reymond-Laruinaz, J.M. Decams, et al.
Applied Surface Science 288 201 (2014)
https://doi.org/10.1016/j.apsusc.2013.10.007

Deposition of TiO2 thin films by atmospheric plasma post-discharge assisted injection MOCVD

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Surface and Coatings Technology 201 (22-23) 8971 (2007)
https://doi.org/10.1016/j.surfcoat.2007.04.025

Thin Films of Titanium Dioxide Prepared by Chemical Routes using Novel Precursors

K. Shalini, S. Chandrasekaran and S.A. Shivashankar
MRS Proceedings 755 DD7.4 (2002)
https://doi.org/10.1557/PROC-755-DD7.4