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Cited article:

Reaction path analysis for chemical vapor deposition and atomic layer deposition processes: A study of titania thin‐film deposition

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physica status solidi (b) 254 (10) 1700091 (2017)
https://doi.org/10.1002/pssb.201700091

TiO2 chemical vapor deposition on Si(111) in ultrahigh vacuum: Transition from interfacial phase to crystalline phase in the reaction limited regime

P.G. Karlsson, J.H. Richter, M.P. Andersson, et al.
Surface Science 605 (13-14) 1147 (2011)
https://doi.org/10.1016/j.susc.2011.03.001

Thin film growth of TiO2 and Ti2O3 by the new method of liquid injection CVD investigated using optical interferometry, XRD and AFM

M. N. Simcock
Surface and Interface Analysis 38 (7) 1122 (2006)
https://doi.org/10.1002/sia.2359

Thermal Decomposition of Ti(O-iPr)[sub 2](dpm)[sub 2] on Pt Foil

Yong Seok Cho, Sung-Il Cho, Jung Shik Heo, Jeong Chan Kim and Sang Heup Moon
Journal of The Electrochemical Society 153 (3) C195 (2006)
https://doi.org/10.1149/1.2165747