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Cited article:

Atomic Layer Deposition of Ruthenium Thin Films from Ru(thd)3 and Oxygen

T. Aaltonen, M. Ritala, K. Arstila, J. Keinonen and M. Leskelä
Chemical Vapor Deposition 10 (4) 215 (2004)
https://doi.org/10.1002/cvde.200306288

MOCVD for complex multicomponent thin films—a leading edge technology for next generation devices

M. Schumacher, J. Lindner, P.K. Baumann, et al.
Materials Science in Semiconductor Processing 5 (2-3) 85 (2002)
https://doi.org/10.1016/S1369-8001(02)00086-0