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Cited article:

Epitaxial Growth of Silicon Films on SiO2Patterned Si(100) Substrates by Atmospheric Pressure Chemical Vapor Deposition

Chunyan Duan, Youjun Deng, Bin Ai, et al.
Japanese Journal of Applied Physics 51 (9S2) 09MA02 (2012)
https://doi.org/10.7567/JJAP.51.09MA02