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Cited article:

Multiscale Modeling in Chemical Vapor Deposition Processes: Models and Methodologies

N. Cheimarios, G. Kokkoris and A. G. Boudouvis
Archives of Computational Methods in Engineering 28 (2) 637 (2021)
https://doi.org/10.1007/s11831-019-09398-w

Building a data-driven Reduced Order Model of a Chemical Vapor Deposition process from low-fidelity CFD simulations

P.A. Gkinis, E.D. Koronaki, A. Skouteris, I.G. Aviziotis and A.G. Boudouvis
Chemical Engineering Science (2019)
https://doi.org/10.1016/j.ces.2019.01.009

Illuminating nonlinear dependence of film deposition rate in a CVD reactor on operating conditions

N. Cheimarios, E.D. Koronaki and A.G. Boudouvis
Chemical Engineering Journal 181-182 516 (2012)
https://doi.org/10.1016/j.cej.2011.11.008

Enabling a commercial computational fluid dynamics code to perform certain nonlinear analysis tasks

N. Cheimarios, E.D. Koronaki and A.G. Boudouvis
Computers & Chemical Engineering 35 (12) 2632 (2011)
https://doi.org/10.1016/j.compchemeng.2011.03.008