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Cited article:

Reaction and Transport Interplay in Al MOCVD Investigated Through Experiments and Computational Fluid Dynamic Analysis

Theodora C. Xenidou, Nathalie Prud’homme, Constantin Vahlas, Nicholas C. Markatos and Andreas G. Boudouvis
Journal of The Electrochemical Society 157 (12) D633 (2010)
https://doi.org/10.1149/1.3493617

An experimental and computational analysis of a MOCVD process for the growth of Al films using DMEAA

T.C. Xenidou, A.G. Boudouvis, N.C. Markatos, et al.
Surface and Coatings Technology 201 (22-23) 8868 (2007)
https://doi.org/10.1016/j.surfcoat.2007.04.080

An Experimentally Assisted Computational Analysis of Tin Oxide Deposition in a Cold-Wall APCVD Reactor

T. C. Xenidou, A. G. Boudouvis, D. M. Tsamakis and N. C. Markatos
Journal of The Electrochemical Society 151 (12) C757 (2004)
https://doi.org/10.1149/1.1809592