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This article has been cited by the following article(s):
Reaction and Transport Interplay in Al MOCVD Investigated Through Experiments and Computational Fluid Dynamic Analysis
Theodora C. Xenidou, Nathalie Prud’homme, Constantin Vahlas, Nicholas C. Markatos and Andreas G. Boudouvis Journal of The Electrochemical Society 157(12) D633 (2010) https://doi.org/10.1149/1.3493617
An experimental and computational analysis of a MOCVD process for the growth of Al films using DMEAA
An Experimentally Assisted Computational Analysis of Tin Oxide Deposition in a Cold-Wall APCVD Reactor
T. C. Xenidou, A. G. Boudouvis, D. M. Tsamakis and N. C. Markatos Journal of The Electrochemical Society 151(12) C757 (2004) https://doi.org/10.1149/1.1809592