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Cited article:

Study of SiO₂-films deposited by adding N₂O or O₂ to TEOS in photo-chemical vapor deposition at room temperature

Y. Motoyama, J.-I. Miyano, K. Toshikawa, Y. Yagi, H. Yanagida, K. Kurosawa, A. Yokotani

J. Phys. IV France, 11 PR3 (2001) Pr3-1131-Pr3-1137

DOI: https://doi.org/10.1051/jp4:20013142

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This article has been cited by the following article(s):

SiO2coating of silver nanoparticles by photoinduced chemical vapor deposition

Adam M Boies, Jeffrey T Roberts, Steven L Girshick, et al.
Nanotechnology 20 (29) 295604 (2009)
https://doi.org/10.1088/0957-4484/20/29/295604

Atmospheric Pressure Deposition of Silica Thin Film by Photo-CVD Using Vacuum Ultraviolet Excimer Lamp

Yoshinari MAEZONO, Atsushi YOKOTANI, Kou KUROSAWA, Nobuyuki HISHINUMA and Hiromitsu MATSUNO
The Review of Laser Engineering 32 (1) 54 (2004)
https://doi.org/10.2184/lsj.32.54