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Cited article:

Characterization of low-dielectric constant SiOCN films synthesized by low pressure chemical vapour deposition

L.M. Zambov, B. Ivanov, C. Popov, G. Georgiev, I. Stoyanov, D.B. Dimitrov

J. Phys. IV France, 11 PR3 (2001) Pr3-1005-Pr3-1012

DOI: https://doi.org/10.1051/jp4:20013126

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