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Cited article:

Development of SiNx LPCVD processes for microtechnological applications

B. Rousset, L. Furgal, P. Fadel, A. Fulop, D. Pujos, P. Temple-Boyer

J. Phys. IV France, 11 PR3 (2001) Pr3-937-Pr3-944

DOI: https://doi.org/10.1051/jp4:20013117

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This article has been cited by the following article(s):

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Characterizations of elastic behaviors of silicon nitride thin films with varying thicknesses

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Materials Science and Engineering: A 467 (1-2) 93 (2007)
https://doi.org/10.1016/j.msea.2007.02.096

Annealing and deposition effects of the chemical composition of silicon-rich nitride

K.N. Andersen, W.E. Svendsen, T. Stimpel-Lindner, T. Sulima and H. Baumgärtner
Applied Surface Science 243 (1-4) 401 (2005)
https://doi.org/10.1016/j.apsusc.2004.09.096