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Cited article:

Low pressure CVD of transparent Cu-Al-O and Cu-Ti-O thin films

D. Barreca, G.A. Battiston, U. Casellato, R. Gerbasi, E. Tondello

J. Phys. IV France, 11 PR11 (2001) Pr11-253-Pr11-260

DOI: https://doi.org/10.1051/jp4:20011141

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This article has been cited by the following article(s):

Fe2O3-TiO2 systems grown by MOCVD: an XPS study

Francesca Visentin, Rosalba Gerbasi, Gilberto Rossetto, et al.
Surface Science Spectra 18 (1) 29 (2011)
https://doi.org/10.1116/11.20111001