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Cited article:

Seeded Solid-Phase Epitaxy of Atomic Layer Deposited Aluminum Oxide

Hannah Maret, Derek Weisberg, Helen M. Chan and Nicholas C. Strandwitz
Crystal Growth & Design 16 (3) 1662 (2016)
https://doi.org/10.1021/acs.cgd.5b01744

Annealing study of H2O and O3grown Al2O3deposited by atomic layer chemical vapour deposition on n-type 4H-SiC

Marc Avice, Ulrike Grossner, Ola Nilsen, et al.
Physica Scripta T126 6 (2006)
https://doi.org/10.1088/0031-8949/2006/T126/002

Surface preparation and post thermal treatment effects on interface properties of thin Al2O3 films deposited by ALD

Y. Chang, F. Ducroquet, E. Gautier, et al.
Microelectronic Engineering 72 (1-4) 326 (2004)
https://doi.org/10.1016/j.mee.2004.01.012