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Cited article:
Y. Wang , O. Matsuda , T. Serikawa , K. Murase
J. Phys. IV France, 10 PR7 (2000) Pr7-259-Pr7-262
This article has been cited by the following article(s):
6 articles
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The effect of thermal annealing on crystallization in a-Si:H/SiO2multilayers by using layer by layer plasma oxidation
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Plasma-enhanced chemical vapor deposition of SiOx/SiNx Bragg reflectors
V Gottschalch, R Schmidt, B Rheinländer, et al. Thin Solid Films 416 (1-2) 224 (2002) https://doi.org/10.1016/S0040-6090(02)00704-6
The effect of post-treatments on crystallization in a-Si:H/a-SiNx:H multilayers
Li Wang, Xiaowei Wang, Xinfan Huang, et al. Journal of Non-Crystalline Solids 299-302 751 (2002) https://doi.org/10.1016/S0022-3093(01)01110-3
Interface confinement and local structure in nc-Si/a-SiNxmultilayers (nc≡nanocrystalline, a≡amorphous)
Li Wang, Xiaowei Wang, Xinfan Huang, et al. Journal of Physics: Condensed Matter 13 (44) 9857 (2001) https://doi.org/10.1088/0953-8984/13/44/303
The room-temperature visible photoluminescence from nanocrystalline Si in Si/SiNx superlattices
Li Wang, Zhongyuan Ma, Xinfan Huang, et al. Solid State Communications 117 (4) 239 (2001) https://doi.org/10.1016/S0038-1098(00)00455-5