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Cited article:

In-situ FTIR spectroscopic monitoring of a CVD controlled Si-N-O fibre growth process

U. Vogt, A. Vital, W. Graehlert, M. Leparoux, H. Ewing, A. Beil, R. Daum, H. Hopfe

J. Phys. IV France, 10 PR2 (2000) Pr2-43-Pr2-48

DOI: https://doi.org/10.1051/jp4:2000206

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This article has been cited by the following article(s):

In-situ monitoring for CVD processes

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Thin Solid Films 442 (1-2) 60 (2003)
https://doi.org/10.1016/S0040-6090(03)00943-X

In situx-ray photoelectron spectroscopy for thin film synthesis monitoring

M. A. Kelly, M. L. Shek, P. Pianetta, T. M. Gür and M. R. Beasley
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 19 (5) 2127 (2001)
https://doi.org/10.1116/1.1374618