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Cited article:

Carbon nitride films prepared by inductively coupled plasma chemical vapour deposition from a solid carbon source

C. Popov, M.F. Plass, W. Kulisch

J. Phys. IV France, 09 PR8 (1999) Pr8-725-Pr8-732

DOI: https://doi.org/10.1051/jp4:1999891

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This article has been cited by the following article(s):

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The effect of d.c. substrate bias on the properties of nitrogen-rich CNx films

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Optical, electrical and mechanical properties of nitrogen-rich carbon nitride films deposited by inductively coupled plasma chemical vapor deposition

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Thin Solid Films 377-378 156 (2000)
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