Optimisation of the MOCVD of Ti(C, N) in a pulsed H2 - N2 plasma by gas-phase analysis
J. Phys. IV France, 09 PR8 (1999) Pr8-605-Pr8-612
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Gas-phase chemistry in up-scaled plasma enhanced metal-organic chemical-vapor deposition of TiN and Ti(C, N) on tool steel
J. P. A. M. Driessen, A. D. Kuypers and J. SchoonmanJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (4) 1971 (2000)
https://doi.org/10.1116/1.582456