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Cited article:

A Low-Temperature Atmospheric Pressure CVD Process for Growing Thin Films of MoO3 and MoO3-WO3 for Electrochromic Device Applications

K. A. Gesheva and T. Ivanova
Chemical Vapor Deposition 12 (4) 231 (2006)
https://doi.org/10.1002/cvde.200506404

Electrochromic properties of atmospheric CVD MoO3 and MoO3–WO3 films and their application in electrochromic devices

T. Ivanova, K.A. Gesheva, G. Popkirov, M. Ganchev and E. Tzvetkova
Materials Science and Engineering: B 119 (3) 232 (2005)
https://doi.org/10.1016/j.mseb.2004.12.084

Optical properties of chemical vapor deposited thin films of molybdenum and tungsten based metal oxides

K Gesheva, A Szekeres and T Ivanova
Solar Energy Materials and Solar Cells 76 (4) 563 (2003)
https://doi.org/10.1016/S0927-0248(02)00267-2

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

G. Wahl, J. Arndt and O. Stadel
Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies 145 (2002)
https://doi.org/10.1007/978-94-010-0353-7_7