Articles citing this article

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Cited article:

Low-pressure chemical vapour deposition of mullite coatings in a cold-wall reactor

B. Armas, M. de Icaza Herrera, C. Combescure, F. Sibieude, D. Thenegal

J. Phys. IV France, 09 PR8 (1999) Pr8-395-Pr8-402

DOI: https://doi.org/10.1051/jp4:1999849

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This article has been cited by the following article(s):

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

G. Wahl, J. Arndt and O. Stadel
Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies 145 (2002)
https://doi.org/10.1007/978-94-010-0353-7_7

Low-pressure chemical vapour deposition of mullite layers using a cold-wall reactor

B. Armas, F. Sibieude, A. Mazel, R. Fourmeaux and M. de Icaza Herrera
Surface and Coatings Technology 141 (1) 88 (2001)
https://doi.org/10.1016/S0257-8972(01)01132-X