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This article has been cited by the following article(s):
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Flash-Enhanced Atomic Layer Deposition: Basics, Opportunities, Review, and Principal Studies on the Flash-Enhanced Growth of Thin Films
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Pattern-dependent microloading and step coverage of silicon nitride thin films deposited in a single-wafer thermal chemical vapor deposition chamber
Jacob W. Smith, Sean M. Seutter and R. Suryanaryanan Iyer Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 23(6) 2340 (2005) https://doi.org/10.1116/1.2102947
Atomic-order thermal nitridation of Si(100) and subsequent growth of Si
T. Watanabe, M. Sakuraba, T. Matsuura and J. Murota Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 19(4) 1907 (2001) https://doi.org/10.1116/1.1359549