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Cited article:

COMPOSITION, STRUCTURE, AND FUNCTIONAL PROPERTIES OF THIN SILICON NITRIDE FILMS GROWN BY ATOMIC LAYER DEPOSITION FOR MICROELECTRONIC APPLICATIONS (REVIEW OF 25 YEARS OF RESEARCH)

V. Yu. Vasiliev
Journal of Structural Chemistry 63 (7) 1019 (2022)
https://doi.org/10.1134/S0022476622070022

Flash-Enhanced Atomic Layer Deposition: Basics, Opportunities, Review, and Principal Studies on the Flash-Enhanced Growth of Thin Films

Thomas Henke, Martin Knaut, Christoph Hossbach, et al.
ECS Journal of Solid State Science and Technology 4 (7) P277 (2015)
https://doi.org/10.1149/2.0301507jss

Pattern-dependent microloading and step coverage of silicon nitride thin films deposited in a single-wafer thermal chemical vapor deposition chamber

Jacob W. Smith, Sean M. Seutter and R. Suryanaryanan Iyer
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 23 (6) 2340 (2005)
https://doi.org/10.1116/1.2102947

Atomic-order thermal nitridation of Si(100) and subsequent growth of Si

T. Watanabe, M. Sakuraba, T. Matsuura and J. Murota
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 19 (4) 1907 (2001)
https://doi.org/10.1116/1.1359549