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Cited article:

Growth of Dysprosium‐, Scandium‐, and Hafnium‐based Third Generation High‐κ Dielectrics by Atomic Vapor Deposition

C. Adelmann, P. Lehnen, S. Van Elshocht, C. Zhao, B. Brijs, A. Franquet, T. Conard, M. Roeckerath, J. Schubert, O. Boissière, C. Lohe and S. De Gendt
Chemical Vapor Deposition 13 (10) 567 (2007)
https://doi.org/10.1002/cvde.200706604

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

G. Wahl, J. Arndt and O. Stadel
Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies 145 (2002)
https://doi.org/10.1007/978-94-010-0353-7_7