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Cited article:

Prediction of LPCVD silicon film microstructure from local operating conditions using numerical modeling

A. Dollet, B. Caussat, J.P. Couderc

J. Phys. IV France, 09 PR8 (1999) Pr8-181-Pr8-188

DOI: https://doi.org/10.1051/jp4:1999822

PDF (1.313 MB)

This article has been cited by the following article(s):

Multiscale simulation of silicon film growth

C. Cavallotti, E. Pantano, A. Veneroni and M. Masi
Crystal Research and Technology 40 (10-11) 958 (2005)
https://doi.org/10.1002/crat.200410467