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Cited article:

Correlations between stress and microstructure into LPCVD silicon films

P. Temple-Boyer, B. de Mauduit, B. Caussat, J.P. Couderc

J. Phys. IV France, 09 PR8 (1999) Pr8-1107-Pr8-1114

DOI: https://doi.org/10.1051/jp4:19998138

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This article has been cited by the following article(s):

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Thin Solid Films 518 (23) 6897 (2010)
https://doi.org/10.1016/j.tsf.2010.07.037

Physicochemical Characterization of Annealed PolySi/NIDOS/SiO2Structures

R. Mahamdi, L. Saci, F. Mansour, et al.
Spectroscopy Letters 42 (3) 167 (2009)
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Relation between residual stress and electrical properties of polysilicon/oxide/silicon structures

L Jalabert, P Temple-Boyer, F Olivié, et al.
Microelectronics Reliability 40 (4-5) 597 (2000)
https://doi.org/10.1016/S0026-2714(99)00271-1