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Cited article:

Comparison of tantalum precursors for use in liquid injection CVD of thin film oxides, dielectrics and ferroelectrics

M.J. Crosbie, P.J. Wright, D.J. Williams, P.A. Lane, J. Jones, A.C. Jones, T.J. Leedham, P. O'Brien, H.O. Davies

J. Phys. IV France, 09 PR8 (1999) Pr8-935-Pr8-942

DOI: https://doi.org/10.1051/jp4:19998118

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