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Cited article:

Boron doped polysilicon deposition in a sector reactor : Specific phenomena and properties

E. Scheid, L. Furgal, H. Vergnes

J. Phys. IV France, 09 PR8 (1999) Pr8-885-Pr8-892

DOI: https://doi.org/10.1051/jp4:19998111

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This article has been cited by the following article(s):

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Study of Nitrogen Effect on the Boron Diffusion during Heat Treatment in Polycrystalline Silicon/Nitrogen-Doped Silicon Thin Films

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Japanese Journal of Applied Physics 50 (5R) 051301 (2011)
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Physicochemical Characterization of Annealed PolySi/NIDOS/SiO2Structures

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Influence of dopant concentration and type of substrate on the local organization of low-pressure chemical vapour deposition in situ boron doped silicon films from silane and boron trichloride

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