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Cited article:

Deposition kinetics of Al₂O₃ from AlCl₃-CO₂-H₂-HCl gas mixtures by thermal CVD in a hot-wall reactor

M. Schierling, E. Zimmermann, D. Neuschütz

J. Phys. IV France, 09 PR8 (1999) Pr8-85-Pr8-91

DOI: https://doi.org/10.1051/jp4:1999811

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