Remote plasma metalorganic chemical vapor deposition of GaN epilayers
J. Phys. IV France, 09 PR8 (1999) Pr8-799-Pr8-804
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Direct growth of highly oriented GaN thin films on silicon by remote plasma CVD
Lise Watrin, François Silva, Cyril Jadaud, Pavel Bulkin, Jean-Charles Vanel, Dominique Muller, Erik V Johnson, Karim Ouaras and Pere Roca I CabarrocasJournal of Physics D: Applied Physics 57 (31) 315106 (2024)
https://doi.org/10.1088/1361-6463/ad436c