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Cited article:

Photo-MOCVD of Cu thin films using Cu(hfa)(MHY) as precursor

S. Vidal, F. Maury, A. Gleizes, T.-Y. Chen, P. Doppelt

J. Phys. IV France, 09 PR8 (1999) Pr8-791-Pr8-798

DOI: https://doi.org/10.1051/jp4:19998100

PDF (1.135 MB)

This article has been cited by the following article(s):

Characterization of low temperature photo-assisted metal-organic chemical vapor deposited copper films using hexafluoroacetylacetonate copper(I) trimethylvinylsilane as precursor

You-Lin Wu, Ming-Hsuan Hsieh and Huey-Liang Hwang
Thin Solid Films 483 (1-2) 10 (2005)
https://doi.org/10.1016/j.tsf.2004.12.010