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Cited article:

In situ diagnostic of etch plasmas for process control using quantum cascade laser absorption spectroscopy

N. Lang, J. Röpcke, S. Wege and A. Steinbach
The European Physical Journal Applied Physics 49 (1) 13110 (2010)
https://doi.org/10.1051/epjap/2009198

Introduction to Complex Plasmas

Jürgen Röpcke, Richard Engeln, Daan Schram, Antoine Rousseau and Paul B. Davies
Springer Series on Atomic, Optical, and Plasma Physics, Introduction to Complex Plasmas 59 315 (2010)
https://doi.org/10.1007/978-3-642-10592-0_13

Plasma process monitoring of BCl3using high-resolution infrared laser absorption spectroscopy

F Hempel, N Lang, H Zimmermann, S Strämke and J Röpcke
Measurement Science and Technology 21 (8) 085703 (2010)
https://doi.org/10.1088/0957-0233/21/8/085703

Microstripline applicators for creating microplasma discharges with microwave energy

J J Narendra, T A Grotjohn and J Asmussen
Plasma Sources Science and Technology 17 (3) 035027 (2008)
https://doi.org/10.1088/0963-0252/17/3/035027

On the Reaction Kinetics of Chemically Active Molecular Microwave Plasmas

G. D. Stancu, A. V. Pipa, G. Lombardi, et al.
Contributions to Plasma Physics 45 (5-6) 358 (2005)
https://doi.org/10.1002/ctpp.200510041