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Cited article:

AVD and ALD as Two Complementary Technology Solutions for Next Generation Dielectric and Conductive Thin-Film Processing

M. Schumacher, P. K. Baumann and T. Seidel
Chemical Vapor Deposition 12 (2-3) 99 (2006)
https://doi.org/10.1002/cvde.200500027

Microstructure and electrical characterizations of yttrium oxide and yttrium silicate thin films deposited by pulsed liquid-injection plasma-enhanced metal-organic chemical vapor deposition

C. Durand, C. Dubourdieu, C. Vallée, et al.
Journal of Applied Physics 96 (3) 1719 (2004)
https://doi.org/10.1063/1.1766412

Structural studies of annealed ultrathin La[sub 0.8]MnO[sub 3] films

Q. Qian, T. A. Tyson, C. Dubourdieu, et al.
Applied Physics Letters 80 (15) 2663 (2002)
https://doi.org/10.1063/1.1470689