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Cited article:

The deposition behavior of SiO[sub 2]–TiO[sub 2] thin film by metalorganic chemical vapor deposition method

Si-Moo Lee, Jeong-Hoon Park, Kug-Sun Hong, Woon-Jo Cho and Dong-Lae Kim
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (5) 2384 (2000)
https://doi.org/10.1116/1.1287154

Elastic measurements in (TaSe4)2I at low frequencies under direct current

A.J. Rivero, H.R. Salva, A.A. Ghilarducci, P. Monceau and F. Levy
Solid State Communications 106 (1) 13 (1998)
https://doi.org/10.1016/S0038-1098(97)10242-3