Articles citing this article

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Cited article:

Ion bombardment and temperature effects on the microstructure of RF plasma chemical vapor-deposited SiC:H

L. Thomas, M. Ducarroir, R. Hillel and R. Berjoan
Surface and Coatings Technology 142-144 829 (2001)
https://doi.org/10.1016/S0257-8972(01)01118-5

Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

L. Thomas, L. Maillé, J.M. Badie and M. Ducarroir
Surface and Coatings Technology 142-144 314 (2001)
https://doi.org/10.1016/S0257-8972(01)01081-7