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Growth of Copper Films by Metal Organic Vapor Deposition Using (Pyrazolylborate)copper(I) Compounds
Elisabeth-Charlotte Plappert, Thomas Stumm, Herbert van den Bergh, Roland Hauert and Klaus-Hermann Dahmen Chemical Vapor Deposition 3(1) 37 (1997) https://doi.org/10.1002/cvde.19970030106
Metal—organic chemical vapor deposition of copper using hydrated copper formate as a new precursor