Articles citing this article

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Cited article:

Preparation of thin copper films from the vapour phase of volatile copper(I) and copper(II) derivatives by the CVD method

Vladimir N Vertoprakhov and Sergey A Krupoder
Russian Chemical Reviews 69 (12) 1057 (2000)
https://doi.org/10.1070/RC2000v069n12ABEH000572

Growth of Copper Films by Metal Organic Vapor Deposition Using (Pyrazolylborate)copper(I) Compounds

Elisabeth-Charlotte Plappert, Thomas Stumm, Herbert van den Bergh, Roland Hauert and Klaus-Hermann Dahmen
Chemical Vapor Deposition 3 (1) 37 (1997)
https://doi.org/10.1002/cvde.19970030106

Metal—organic chemical vapor deposition of copper using hydrated copper formate as a new precursor

Marie-José Mouche, Jean-Luc Mermet, Maurice Romand and Marlène Charbonnier
Thin Solid Films 262 (1-2) 1 (1995)
https://doi.org/10.1016/0040-6090(95)05813-3