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Cited article:

Deposition of titanium nitride thin films at low temperatures by CVD using metalorganic and organometallic titanium compounds as precursors

C.I.M.A. SPEE, J.L. LINDEN, E.A. VAN DER ZOUWEN-ASSINK, K. TIMMER, F. VERBEEK, H.A. MEINEMA, D.M. FRIGO, S. VAN DER VEN

J. Phys. IV France, 03 C3 (1993) C3-289-C3-296

DOI: https://doi.org/10.1051/jp4:1993340

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