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Cited article:

An innovative kinetic model allowing insight in the moderate temperature chemical vapor deposition of silicon oxynitride films from tris(dimethylsilyl)amine

Konstantina Christina Topka, Hugues Vergnes, Tryfon Tsiros, et al.
Chemical Engineering Journal 431 133350 (2022)
https://doi.org/10.1016/j.cej.2021.133350

The Price Effects of Event Risk Protection: The Results from a Natural Experiment

Karl S. Okamoto, David J. Pedersen and Natalie Bucciarelli Pedersen
SSRN Electronic Journal (2010)
https://doi.org/10.2139/ssrn.1641304

Les différentes voies de modélisation macroscopique du procédé de dépôt de SiC par voie gazeuse

J AUBRETON, E BLANQUET, M ELCHINGER and M PONS
Annales de Chimie Science des Matériaux 23 (5-6) 753 (1998)
https://doi.org/10.1016/S0151-9107(99)80022-1