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Electrical-stress driven oxidation in 940 nm oxide-confined VCSEL
Michael Pusterhofer, Robert Fabbro, Raffaele A Coppeta, Gernot Fasching and Peter Hadley Semiconductor Science and Technology 37(1) 015010 (2022) https://doi.org/10.1088/1361-6641/ac3c99
In situ TEM study of dislocation mobility in semiconducting materials