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Cited article:

LOW-TEMPERATURE SILICON AND GERMANIUM CVD IN ULTRACLEAN ENVIRONMENT

J. MUROTA, M. KATO, R. KIRCHER, S. ONO

J. Phys. IV France, 02 C2 (1991) C2-795-C2-802

DOI: https://doi.org/10.1051/jp4:1991293

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