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Cited article:

OPTIMUM PROCESS CONDITIONS FOR STABLE AND EFFECTIVE OPERATION OF A FLUIDIZED BED CVD REACTOR FOR POLYCRYSTALLINE SILICON PRODUCTION

T. KOJIMA, O. MORISAWA

J. Phys. IV France, 02 C2 (1991) C2-475-C2-482

DOI: https://doi.org/10.1051/jp4:1991258

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This article has been cited by the following article(s):

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Chemical Vapor Deposition 17 (10-12) 305 (2011)
https://doi.org/10.1002/cvde.201106888

Influence des principaux paramètres opératoires sur le dépôt de silicium à partir de silane par CVD en lit fluidisé en vue de limiter les problèmes d'agglomération

J. Rodriguez Ramiro Ruvalcaba, Brigitte Caussat, Merhdji Hemati and Jean‐Pierre Couderc
The Canadian Journal of Chemical Engineering 78 (5) 955 (2000)
https://doi.org/10.1002/cjce.5450780513