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Trends in Copper Precursor Development for CVD and ALD Applications
Peter G. Gordon, Agnieszka Kurek and Seán T. Barry ECS Journal of Solid State Science and Technology 4(1) N3188 (2015) https://doi.org/10.1149/2.0261501jss
Nonthermal plasma synthesis of metal sulfide nanocrystals from metalorganic vapor and elemental sulfur
Comparative Study on Cu-CVD Nucleation Using β-diketonato and Amidinato Precursors for Sub-10-nm-Thick Continuous Film Growth
Kohei Shima, Hideharu Shimizu, Takeshi Momose and Yukihiro Shimogaki ECS Journal of Solid State Science and Technology 4(8) P305 (2015) https://doi.org/10.1149/2.0061508jss
Surface-Selective Chemical Vapor Deposition of Copper Films through the Use of a Molecular Inhibitor
Shaista Babar, Elham Mohimi, Brian Trinh, Gregory S. Girolami and John R. Abelson ECS Journal of Solid State Science and Technology 4(7) N60 (2015) https://doi.org/10.1149/2.0061507jss
Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO[sub 2]
Thomas Waechtler, Steffen Oswald, Nina Roth, et al. Journal of The Electrochemical Society 156(6) H453 (2009) https://doi.org/10.1149/1.3110842
Hot‐wire CVD of copper films on self‐assembled‐monolayers of MPTMS