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Cited article:

Comparative Spectroscopic Study of Aluminum Nitride Grown by MOCVD in H2 and N2 Reaction Environment

Samiul Hasan, Mohi Uddin Jewel, Stavros G. Karakalos, Mikhail Gaevski and Iftikhar Ahmad
Coatings 12 (7) 924 (2022)
https://doi.org/10.3390/coatings12070924

Chemical Vapor Deposition for Nanotechnology

Vincent Astié, Cyril Millon, Jean-Manuel Decams and Ausrine Bartasyte
Chemical Vapor Deposition for Nanotechnology (2019)
https://doi.org/10.5772/intechopen.80244

Chemical approaches to the Metalorganic CVD of Group‐III Nitrides

Anthony C. Jones, Colin R. Whitehouse and John S. Roberts
Chemical Vapor Deposition 1 (3) 65 (1995)
https://doi.org/10.1002/cvde.19950010302