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Cited article:

HETEROEPITAXIAL GROWTH OF TiO₂, VO₂, AND TiO₂/VO₂ MULTILAYERS BY MOCVD

H.L.M. CHANG, Y. GAO, J. GUO, C.M. FOSTER, H. YOU, T.J. ZHANG, D.J. LAM

J. Phys. IV France, 02 C2 (1991) C2-953-C2-960

DOI: https://doi.org/10.1051/jp4:19912115

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This article has been cited by the following article(s):

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Physical Review Letters 102 (16) (2009)
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Thin films of VO2 on glass by atomic layer deposition: microstructure and electrical properties

Pritesh Dagur, Anil U. Mane and S.A. Shivashankar
Journal of Crystal Growth 275 (1-2) e1223 (2005)
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Phase transformation and semiconductor-metal transition in thin films of VO[sub 2] deposited by low-pressure metalorganic chemical vapor deposition

M. B. Sahana, G. N. Subbanna and S. A. Shivashankar
Journal of Applied Physics 92 (11) 6495 (2002)
https://doi.org/10.1063/1.1518148