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Cited article:

CVD CARBONYL THIN FILMS OF TUNGSTEN AND MOLYBDENUM AND THEIR SILICIDES - A GOOD ALTERNATIVE TO CVD FLUORIDE TUNGSTEN TECHNOLOGY

K.A. GESHEVA, V. ABROSIMOVA, G.D. BESHKOV

J. Phys. IV France, 02 C2 (1991) C2-865-C2-871

DOI: https://doi.org/10.1051/jp4:19912103

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