Low Temperature Deposition of TiN Ceramic Material by Metal Organic and/or Plasma Enhanced CVD C.I.M.A. Spee, J.P.A.M. Driessen et A.D. Kuypers J. Phys. IV France, 05 C5 (1995) C5-719-C5-734 DOI: 10.1051/jphyscol:1995587