Journal de Physique IV

Kinetics of the drying process of an anti-adherent coating using Photothermal Radiometry and Micro-Raman

D.M. Hurtado-Castañeda, J. Fernández, R. Velázquez, M. Estévez, S. Vargas, R. Rodríguez and M.E. Rodríguez

J. Phys. IV France, 125 (2005) 593-596

DOI: 10.1051/jp4:2005125136

D.M. Hurtado-Castañeda

J. Fernández

R. Velázquez

M. Estévez

S. Vargas

R. Rodríguez

M.E. Rodríguez

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