Journal de Physique IV

Subscriber Authentication Point

EDPS Account

Fast control unit for electron beam lithography Systems especially for X-ray and EUV optics

S. Rudolph, S. Heim, D. Rudolph and G. Schmahl

J. Phys. IV France, 104 (2003) 203-205

DOI: 10.1051/jp4:200300061

This search tool will display articles in Google Scholar database by authors of the selected article:

Select your author(s):

S. Rudolph

S. Heim

D. Rudolph

G. Schmahl

Search method:

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)