Journal de Physique IV

Characterization of amorphous SIC:H thin films grown by RF plasma enhanced CVD on annealing temperature

M.G. Park, W.S. Choi, J.-H. Boo, Y.T. Kim, D.H. Yoon and B. Hong

J. Phys. IV France, 12 4 (2002) 155-160

DOI: 10.1051/jp4:20020090

M.G. Park

W.S. Choi

J.-H. Boo

Y.T. Kim

D.H. Yoon

B. Hong

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)