Journal de Physique IV

Electron-impact silane dissociation and deposition rate relationship in the PECVD of microcrystalline silicon thin films

E. Amanatides, D.E. Rapakoulias and D. Mataras

J. Phys. IV France, 11 PR3 (2001) Pr3-715-Pr3-722

DOI: 10.1051/jp4:2001390

E. Amanatides

D.E. Rapakoulias

D. Mataras

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