Journal de Physique IV

CVD copper thin film deposition using (α-methylstyrene)Cu(I)(hfac)

W. Zhuang, L.J. Charneski, D.R. Evans, S.T. Hsu, Z. Tang and A.M. Guloy

J. Phys. IV France, 11 PR3 (2001) Pr3-553-Pr3-560

DOI: 10.1051/jp4:2001370

W. Zhuang

L.J. Charneski

D.R. Evans

S.T. Hsu

Z. Tang

A.M. Guloy

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